Search results for "high-k material"

Electrochemically Prepared High-k Thin Films for Resistive Switching Devices

Profiling of traps in SiO2/Al2O3 gate stack by the charge pumping technique

2006

In this paper, we present our results on the distribution and generation of traps in a SiO 2 /A1 2 O 3 transistor. The investigation has been carried out by using charge pumping measurements, both variable voltage and frequency techniques, and constant voltage stress. By increasing the amplitude of the gate pulse we observe an increase of the charge recombined per cycle closely related to the contribution of shallow traps near the SiO 2 /Al 2 O 3 interface. By reducing the pulse frequency we measure an increase in the charge pumping current due to traps located deeper in the Al 2 O 3 . By combining charge pumping and constant voltage stress measurements, we found that the traps are mostly g…

Electrochemical Oxidation of Hf-Nb Alloys as a Valuable Route to Prepare Mixed Oxides of Tailored Dielectric Properties

2018

Metal oxides with high dielectric constant are extensively studied in the frame of substituting SiO2 as gate dielectric in nanoelectronic devices. Here, high-k mixed HfO2/Nb2O5 oxides are prepared by a facile electrochemical route starting from sputtering-deposited Hf–Nb alloys with several compositions. Transmission electron microscopy, grazing incidence X-ray diffraction, and glow discharge optical emission spectroscopy are employed to study the oxide structures, disclosing a crystalline–amorphous transition of the electrochemically prepared oxides by increasing the Nb content. Photo-electrochemical measurements allow the observation of optical transitions ascribed to localized states ins…

Anodization and anodic oxides

2018

Anodizing is a low-temperature, low-cost electrochemical process allowing for the growth, on the surface of valve metals and valve metal alloys, of anodic oxides of tunable composition and properties. This article is an overview on theoretical aspects concerning the general aspects of the kinetics of growth of barrier and porous anodic oxides and some of their present and possibly future technological applications of anodic oxides. The first part of the article is devoted to anodic oxide growth models, from Guntherschulze and Betz work (in 1934) to the more recent results on barrier and porous oxide films. The second part is focused on industrial processes to fabricate anodic oxides and the…